Working draft
ISO/WD 19383
Atomic Layer Deposition-- Chemical characteristics and related process specifications of atomic layer deposition precursors
Reference number
ISO/WD 19383
Edition 1
© ISO 2024
Working draft
Under development
A working group has prepared a draft.

Abstract

This document describes the chemical characteristics and related process specifications of the atomic layer deposition precursors, including assay content, metal purity, and anion content specification.

General information

  • Status
     : Under development
    Stage
    : Close of comment period [20.60]
  • Edition
     : 1
  • Technical Committee :
    ISO/TC 107
  • RSS updates

Life cycle

Sustainable Development Goals

This standard contributes to the following Sustainable Development Goal

9
Industry, Innovation and Infrastructure

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